
InP HBTs
Growth, Processing and Applications
Artech House Publishers
Published on 30. November 1994
Book
Hardback
432 pages
978-0-89006-724-6 (ISBN)
Description
This work provides a comprehensive overview of current InP HBT technology and its applications. Each chapter is written by a world-renowned expert on topics including crystal growth, processing, physics, modelling, and digital and analog circuits.
More details
Series
Edition
New
Language
English
Place of publication
Norwood
United States
Target group
College/higher education
Professional and scholarly
Product notice
Laminated cover
Illustrations
black & white illustrations
Dimensions
Height: 236 mm
Width: 159 mm
Thickness: 27 mm
Weight
689 gr
ISBN-13
978-0-89006-724-6 (9780890067246)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Classification
Content
Part 1 Introduction: wet chemical etch mixtures for InP; wet chemical etch mixtures for other III-V materials. Part 2 Growth of InP-based heterojunction bipolar transistors: substrate preparation; growth behaviour and control; doping; N-type doping; P-type dopants; growth of device structures; selective epitaxial growth. Part 3 Self-aligned processing of InP-based HBTs: wet chemical processing; wet etching of InP and related compounds; dry etch processing; dry etching of InP and related compounds; device results. Part 4 Non-equilibrium electron transport in heterojunction bipolar transistors: advantages of HBTs; electron transport in semiconductors; the semiclassical approach; preliminary considerations; effect of reducing xb on electron transport; effect of reducing xc on collector transport; ultra-high-frequency performance; comparison of graded and abrupt junction HBTs; comments on semiclassical understanding. Part 5 Device and circuit fabrication, device characteristics, and reliability: device and circuit fabrication; performance of AlInAs/GaInAs HBT over temperature; performance of InP-based double heterojunction bipolar transistors; InP-based HBT reliability. Part 6 Radiation effects on InP-based heterojunction bipolar transistors: previous work; experimental AlInAs/InGaAs total dose experiments; comparison with GaAs/AlGaAs HBTs; GaAs/AlGaAs transient dose results; stimulation of transient ionizing radiation. Part 7 Device physics and modelling: basic device operation; junction design; submicron InP HBT for low-power ultrawideband applications; current transport in abrupt emitter HBTs; device modelling; DC model; small signal model; large signal model; noise; strain-base InP HBT; Gunn oscillations in the collector transit region. Part 8 High speed InP HBT circuits: an overview of InP technology; current-mode logic. Part 9 Analog-to-digital converters using III-V HBTs: III-V HBT device characteristics; a review of high-speed ADC architectures; analog-to-digital converter components; digital-to-analog converters; layout and packaging considerations for ADC circuits; future predictions. Part 10 Millimeter wave generation using InP HBT phototransistors: picosecond optoelectronic measurement system; HBT as a photodetector; transport equations; optical gain; optical gain G and current gain B; transient response and bandwidth of a phototransistor; millimeter wave generation by optically injecting HBTs; CW optical mixing experiments.