Handbook of Thin Film Process Technology
98/2 Recipes for Optical Materials
1st Edition
Published on 1. January 1998
Book
Hardback
384 pages
978-0-7503-0529-7 (ISBN)
Description
The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. The main work is regularly updated with new topics, and this volume presents additional recipe-type information (i.e. important deposition system details and process parameters) for optical materials.
More details
Language
English
Place of publication
London
United Kingdom
Publishing group
Taylor & Francis Ltd
Target group
College/higher education
Professional and scholarly
Written at a level suitable for R&D scientists, engineers and technicians working in an industrial environment, or for graduate studenst and academic researchers interested in the practical aspects of thin film fabrication and processing.
Dimensions
Height: 235 mm
Width: 156 mm
Weight
454 gr
ISBN-13
978-0-7503-0529-7 (9780750305297)
Copyright in bibliographic data is held by Nielsen Book Services Limited or its licensors: all rights reserved.
Schweitzer Classification
Persons
Content
X3 Optical Materials
Introduction (Targrove)
Pulsed laser deposition of Zn0:Ga (Hirata and McKittrick).
Deposition of transparent conducting Zn0 thin films by excimer laser ablation (Hiramatsu).
Zn0:A1 by facing targets planar magnetron sputtering (Tominaga).
Deposition of Zn0-In203 by CVD (Manami).
Ion beam sputtering by Ti02 (Siegfried).
Reactive sputtering of Ti02 (Shah).
Ti02 growth by molecular beam epitaxy (Sugimura).
Structural control of Ti02 by Ar-ion beam sputtering and ion-assisted deposition (Maki).
Reactive sputtering of Indium Tin Oxide (ITO) (Schmitt and Carl).
Highly transparent and conductive Ga203-In203 films prepared by DC magnetron sputtering (Minami).
Electron cyclotron resonance oxygen-plasma-assisted deposition of Zr02 (Moulzolf and Lad).
Zirconium oxyfluoride by IBAD (Gibson).
Radio frequency magnetron sputtering of Ce02 films (Sundaram).
Dual source radio frequency magnetron sputtering of CaF2 (Dudney).
Introduction to MgF2 (Targrove).
Deposition of MgF2 films by termal evaporation (Dabringhaus). MgF2, Si02 and Ti02 thin films prepared by ion-assisted electron beam evaporation (Tsai). Radiofrequency (rf) magnetron sputtering of Mg0 films (Misaki).
Ion-assisted reactive evaporation of V02 (Case).
Reactive radio-frequency sputtering of vanadium oxides thin films (Micocci).
PECVD of a-c:0:H films (Durrant).
Ion beam sputtering of Si02 (Siegfried).
E-beam evaporation of dense moisture stable films of Ta23056 (Morton).
Reactive magnetron sputtering of Si02/Si3N4/Ti02/Ag (Martin).
DC and RF magnetron sputtering of Cr and Si3N4 (Martin).
Ion beam sputtering of Hf02 (Siegfried).
Introduction (Targrove)
Pulsed laser deposition of Zn0:Ga (Hirata and McKittrick).
Deposition of transparent conducting Zn0 thin films by excimer laser ablation (Hiramatsu).
Zn0:A1 by facing targets planar magnetron sputtering (Tominaga).
Deposition of Zn0-In203 by CVD (Manami).
Ion beam sputtering by Ti02 (Siegfried).
Reactive sputtering of Ti02 (Shah).
Ti02 growth by molecular beam epitaxy (Sugimura).
Structural control of Ti02 by Ar-ion beam sputtering and ion-assisted deposition (Maki).
Reactive sputtering of Indium Tin Oxide (ITO) (Schmitt and Carl).
Highly transparent and conductive Ga203-In203 films prepared by DC magnetron sputtering (Minami).
Electron cyclotron resonance oxygen-plasma-assisted deposition of Zr02 (Moulzolf and Lad).
Zirconium oxyfluoride by IBAD (Gibson).
Radio frequency magnetron sputtering of Ce02 films (Sundaram).
Dual source radio frequency magnetron sputtering of CaF2 (Dudney).
Introduction to MgF2 (Targrove).
Deposition of MgF2 films by termal evaporation (Dabringhaus). MgF2, Si02 and Ti02 thin films prepared by ion-assisted electron beam evaporation (Tsai). Radiofrequency (rf) magnetron sputtering of Mg0 films (Misaki).
Ion-assisted reactive evaporation of V02 (Case).
Reactive radio-frequency sputtering of vanadium oxides thin films (Micocci).
PECVD of a-c:0:H films (Durrant).
Ion beam sputtering of Si02 (Siegfried).
E-beam evaporation of dense moisture stable films of Ta23056 (Morton).
Reactive magnetron sputtering of Si02/Si3N4/Ti02/Ag (Martin).
DC and RF magnetron sputtering of Cr and Si3N4 (Martin).
Ion beam sputtering of Hf02 (Siegfried).