Handbook of Thin Film Process Technology
98/1 Reactive Sputtering
David A. Glocker(Author)
Institute of Physics Publishing
1st Edition
Published on 1. July 1998
Book
Hardback
76 pages
978-0-7503-0528-0 (ISBN)
Description
The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. The main work is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.
More details
Language
English
Place of publication
London
United Kingdom
Publishing group
Taylor & Francis Ltd
Target group
College/higher education
Professional and scholarly
Written at a level suitable for R&D scientists, engineers and technicians working in an industrial environment, or for graduate students and academic researchers interested in the practical aspects of thin film fabrication and processing.
Dimensions
Height: 235 mm
Width: 156 mm
Weight
318 gr
ISBN-13
978-0-7503-0528-0 (9780750305280)
Copyright in bibliographic data is held by Nielsen Book Services Limited or its licensors: all rights reserved.
Schweitzer Classification
Persons
Author
Editor
Isoflux Inc, USA
University of Delaware, USA
Bell Northern Research, Canada
Content
A5 Reactive Sputtering (Guest Editor William D Westwood)
A5.0 Introduction and general discussion (William D. Westwood)
A5.1 AC and RF reactive sputtering (Grant O Este and William D Westwood)
A5.2. Reactive pulsed d.c. magnetron sputtering and control (J M Schneider and W D Sproul)
A5.3 Modeling of the reactive sputtering process (S Berg, T Nyberg, H-O Blom and C Nender)
A5.0 Introduction and general discussion (William D. Westwood)
A5.1 AC and RF reactive sputtering (Grant O Este and William D Westwood)
A5.2. Reactive pulsed d.c. magnetron sputtering and control (J M Schneider and W D Sproul)
A5.3 Modeling of the reactive sputtering process (S Berg, T Nyberg, H-O Blom and C Nender)