Thin Films for Emerging Applications: Volume 16
Volume 16
Maurice H. Francombe(Editor)
Academic Press
Published on 6. July 1992
Book
Hardback
367 pages
978-0-12-533016-9 (ISBN)
Description
Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate applications. Detailed treatment is also given to permanent magnet thin films, lateral diffusion and electromigration in metallic thin films, and fracture and cracking phenomena in thin films adhering to high-elongation substrates.
More details
Series
Language
English
Place of publication
San Diego
United States
Publishing group
Elsevier Science Publishing Co Inc
Target group
Professional and scholarly
Researchers, students, and engineers concerned with electronic and optical devices, thin film applications, and novel new materials such as High Tc Superconductors.
Dimensions
Height: 229 mm
Width: 152 mm
Weight
800 gr
ISBN-13
978-0-12-533016-9 (9780125330169)
Copyright in bibliographic data is held by Nielsen Book Services Limited or its licensors: all rights reserved.
Schweitzer Classification
Other editions
Additional editions

Maurice H. Francombe
Thin Films for Emerging Applications
E-Book
10/2013
Academic Press
€54.95
Available for download
Persons
Content
N.G. Dhere, High Tc Superconducting Thin Films. K.V. Reddy, Lateral Diffusion and Electromigration in Metallic Thin Films. F.J. Cadieu, Permanent Magnet Thin Films. P.H. Wojciechowski and M.S. Mendolia, Fracture and Cracking Phenomena in Thin Films Adhering to High-Elongation Substrates. Each chapter includes references. Index.