
Rapid Thermal Processing
Science and Technology
Richard B. Fair(Editor)
Academic Press
Published on 7. June 1993
Book
Hardback
430 pages
978-0-12-247690-7 (ISBN)
Description
This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
More details
Language
English
Place of publication
San Diego
United States
Publishing group
Elsevier Science Publishing Co Inc
Target group
Professional and scholarly
Process engineers working in microelectronic research and development, production and manufacturing engineers working with silicon-integrated circuits, researchers working in semiconductor processing, graduate students and researchers in electronics, electrical engineers.
Dimensions
Height: 229 mm
Width: 152 mm
Weight
770 gr
ISBN-13
978-0-12-247690-7 (9780122476907)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Classification
Other editions
Additional editions

E-Book
12/2012
Academic Press
€54.95
Available for download
Content
1. Rapid Thermal Processing - A Justification
2. Rapid Thermal Processing - Based Epitaxy
3. Rapid Thermal Growth and Processing of Dielectrics
4. Thin-Films Deposition
5. Extended Defects from Ion Implantation and Annealing
6. Junction Formation in Silicon by Rapid Thermal Annealing
7. Silicides
8. Issues in Manufacturing Unique Silicon Devices Using Rapid Thermal Annealing
9. Manufacturing Equipment Issues in Rapid Thermal Processing
Index
2. Rapid Thermal Processing - Based Epitaxy
3. Rapid Thermal Growth and Processing of Dielectrics
4. Thin-Films Deposition
5. Extended Defects from Ion Implantation and Annealing
6. Junction Formation in Silicon by Rapid Thermal Annealing
7. Silicides
8. Issues in Manufacturing Unique Silicon Devices Using Rapid Thermal Annealing
9. Manufacturing Equipment Issues in Rapid Thermal Processing
Index