Advances in Computer Aided Design for Very Large Scale Integration: Process and Device Modelling v. 1
W.L. Engl(Editor)
Elsevier (Publisher)
Published in December 1985
Book
Hardback
472 pages
978-0-444-87891-5 (ISBN)
Description
This book is the first of a new, seven volume series which aims to provide a comprehensive description of basic methods and technologies related to CAD for VLSI. The series includes up-to-date results and latest developments, with a good balance between theoretical and practical aspects of VLSI design. In this volume emphasis is placed on the basics of modeling, the opening chapters being devoted to fundamental process and device modeling. The following chapters cover different aspects of device modeling and also bridge to process simulation on the one side, and circuit simulation on the other. A systems approach to physical modeling, spanning the whole range of topics covered, is also dealt with. Recent conferences on the subject have signalled that physical modeling combined with technology, device and circuit optimization, will undoubtedly become a major trend in the future.
This book is the first of a new, seven volume series which aims to provide a comprehensive description of basic methods and technologies related to CAD for VLSI. The series includes up-to-date results and latest developments, with a good balance between theoretical and practical aspects of VLSI design. In this volume emphasis is placed on the basics of modeling, the opening chapters being devoted to fundamental process and device modeling. The following chapters cover different aspects of device modeling and also bridge to process simulation on the one side, and circuit simulation on the other. A systems approach to physical modeling, spanning the whole range of topics covered, is also dealt with. Recent conferences on the subject have signalled that physical modeling combined with technology, device and circuit optimization, will undoubtedly become a major trend in the future.
This book is the first of a new, seven volume series which aims to provide a comprehensive description of basic methods and technologies related to CAD for VLSI. The series includes up-to-date results and latest developments, with a good balance between theoretical and practical aspects of VLSI design. In this volume emphasis is placed on the basics of modeling, the opening chapters being devoted to fundamental process and device modeling. The following chapters cover different aspects of device modeling and also bridge to process simulation on the one side, and circuit simulation on the other. A systems approach to physical modeling, spanning the whole range of topics covered, is also dealt with. Recent conferences on the subject have signalled that physical modeling combined with technology, device and circuit optimization, will undoubtedly become a major trend in the future.
More details
Series
Language
English
Place of publication
Oxford
United Kingdom
Publishing group
Elsevier Science & Technology
Target group
College/higher education
Professional and scholarly
Illustrations
Illustrations
Dimensions
Height: 230 mm
Width: 150 mm
ISBN-13
978-0-444-87891-5 (9780444878915)
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Schweitzer Classification
Content
Preface. 1. Physical Models and Numerical Methods for VLSI Process Simulation (B. R. Penumalli). 2. Ion Implantation Models for Process Simulation (H. Ryssel, J. P. Biersack). 3. Simulation of Lithography (A. R. Neureuther, W. G. Oldham). 4. Physical Models for Numerical Device Simulation (G. Baccarani et al.). 5. Basic Theory of Stationary Numerical Models (M. S. Mock). 6. New Approaches to Submicron Device Modelling (A. Yoshii, M. Tomizawa). 7. Computational Aspects of Semiconductor Device Simulation (R. E. Bank et al.). 8. On Modeling MOS-Devices (S. Selberherr). 9. Three-Dimensional Device Simulation using a Mixed-Process/Device Simulator (N. Shigyo, R. Dang). 10. Numerical Model Hierarchies (H. K. Dirks). 11. The Application of Process and Device Simulation Tools to VLSI Development (E. J. Prendergast, P. Lloyd, W. T. Cochran). 12. Compact MOSFET Modeling (F. M. Klaassen). 13. Compact Bipolar Transistor Modeling (H. C. De Graaff). 14. Device and Circuit Simulator Integration Techniques (T. Shima).