Handbook of Ion Beam Processing Technology
Principles, Deposition, Film Modification and Synthesis
Published on 31. December 1989
Book
Hardback
456 pages
978-0-8155-1199-1 (ISBN)
Description
Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films.
More details
Language
English
Place of publication
Norwich
United States
Target group
Professional and scholarly
Engineers, technicians, and plant personnel in the semiconductor and related industries.
Dimensions
Height: 229 mm
Width: 152 mm
Weight
710 gr
ISBN-13
978-0-8155-1199-1 (9780815511991)
Copyright in bibliographic data is held by Nielsen Book Services Limited or its licensors: all rights reserved.
Schweitzer Classification
Content
Perspective on Past, Present and Future Uses of Ion Beam TechnologyPart I. Ion Beam TechnologyGridded Broad-beam Ion SourcesECR Ion SourcesHall Effect Ion SourcesIonized Cluster Beam (ICB) Deposition and EpitaxyPart II. Sputtering PhenomenaQuantitative SputteringLaser-induced Fluorescence as a Tool for the Study of Ion Beam SputteringCharacterization of Atoms Desorbed from Surfaces by Ion Bombardment Using Multiphoton Ionization DetectionPart III. Film Modification and SynthesisThe Modification of Films by Ion BombardmentControl of Film Properties by Ion-assisted Deposition Using Broad Beam SourcesEtching with Directed BeamsFilm Growth Modification by Concurrent Ion Bombardment: Theory and SimulationInterface Structure and Thin Film AdhesionModification of Thin Films by Off-normal Incidence Ion BombardmentIon Beam Interactions with Polymer SurfacesTopography: Texturing EffectsMethods and Techniques of Ion Beam ProcessesIon-assisted Dielectric and Optical CoatingsDiamond and Diamond-like Thin Films by Ion Beam TechniquesIndex