
Glow Discharge Processes
Sputtering and Plasma Etching
Brian Chapman(Author)
Wiley (Publisher)
1st Edition
Published on 5. November 1980
Book
Hardback
432 pages
978-0-471-07828-9 (ISBN)
Description
Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
More details
Language
English
Place of publication
United States
Publishing group
John Wiley & Sons Inc
Target group
College/higher education
Professional and scholarly
Product notice
sewn/stitched
Cloth over boards
Dimensions
Height: 240 mm
Width: 161 mm
Thickness: 27 mm
Weight
806 gr
ISBN-13
978-0-471-07828-9 (9780471078289)
Schweitzer Classification
Person
Brian Chapman is the author of Glow Discharge Processes: Sputtering and Plasma Etching, published by Wiley.
Content
Gases
Gas Phase Collision Processes
Plasmas. DC Glow Discharges
RF Discharges. Sputtering
Plasma Etching
Appendices
Index