Photochemical Processing of Electronic Materials
Published on 28. November 1997
Book
Hardback
548 pages
978-0-12-121740-2 (ISBN)
Description
This is a publication reflecting the current state of photoprocessing which offers an introduction to the field, an assessment of potential future applications of the technique and a discussion of problems that have yet to be solved. The book is designed to be of interest to applied research scientists as well as to students and engineers in the field and those in managerial or funding positions.
This is a publication reflecting the current state of photoprocessing which offers an introduction to the field, an assessment of potential future applications of the technique and a discussion of problems that have yet to be solved. The book is designed to be of interest to applied research scientists as well as to students and engineers in the field and those in managerial or funding positions.
This is a publication reflecting the current state of photoprocessing which offers an introduction to the field, an assessment of potential future applications of the technique and a discussion of problems that have yet to be solved. The book is designed to be of interest to applied research scientists as well as to students and engineers in the field and those in managerial or funding positions.
More details
Language
English
Place of publication
San Diego
United States
Publishing group
Elsevier Science Publishing Co Inc
Target group
College/higher education
Professional and scholarly
Dimensions
Height: 229 mm
Width: 152 mm
Weight
971 gr
ISBN-13
978-0-12-121740-2 (9780121217402)
Copyright in bibliographic data is held by Nielsen Book Services Limited or its licensors: all rights reserved.
Schweitzer Classification
Content
Photochemical Processing: Fundamental Mechanisms and Operating Criteria. Developments in Excimer Lasers for Photochemical Processing. Deep UV Optics for Excimer Lasers. Sub-Micron Lithography for Semiconductor Device Ravrication. Promoting Photonucleation on Semiconductor Substrates for Metallization. Considerations of the Microscopic Basis for Photo-Enhanced Chemical Beam Epitaxy. Photo-Assisted II-VI Epitaxial Growth. IR and UV Photo-Assisted Formation of Silicon Dioxide. Gas Immersion Laser Doping (GLD) in Silcon. Photochemical Etching of III-V Semiconductors. Excimer Laser Chemical Etching Fo Silicon and Copper. Laser Ablation of Polymers. Laser Ablation of Superconductors. Fast In-Situ Metallisation: A Comparison of Several Methods with Possible Applications in High Density Multichip Interconnects. Laser Asisted Fabrication of Integrated Circuits in Gallium Arsenide. Photon Probes for In-Process Control During Semiconductor Fabrication. Index.