
Advances in X-Ray Analysis
Volume 38
Kluwer Academic/Plenum Publishers
Published on 30. September 1995
Book
Hardback
XXVI, 787 pages
978-0-306-45045-7 (ISBN)
Description
The 43rd Annual Conference on Applications ofX-ray Analysis was held August 1-5, 1994, at the Sheraton Steamboat Resort & Conference Center in Steamboat Springs, Colorado. The Denver X-Ray Conference has evolved from the 1950's into an international forum for the interaction of scientists, engineers and technologists interested in the use of x-rays in materials characterization. It has not only acted as a venue but has both stimulated and nurtured many of the principal developments in this field over the years. The major changes that have been occurring on the national and international scene as a result of the end of the cold war have dramatic-ally affected the way the materials community does business. The removal of defense priorities and development funds from most new materials initiatives has stimulated the char acterization communities to look to increasing the speed of their methods. This is being accom plished via the development of very fast dynamic characterization procedures which can rapidly and intelligently monitor and optimize the formation of a desired microstructure. The develop ment of intelligent characterization procedures applied in real-time during the manufacturing process can lead to the ability to design desired microstructures. Another potential advantage to this approach is its ability to characterize the actual amount of material which goes into a final product; permitting a rapid transition from R&D to manufacturing by avoiding the prob lems associated with scale-up.
More details
Edition
1995 edition
Language
English
Place of publication
New York
United States
Publishing group
Springer Science+Business Media
Target group
College/higher education
Professional and scholarly
Research
Product notice
sewn/stitched
Cloth over boards
Illustrations
XXVI, 787 p.
Dimensions
Height: 246 mm
Width: 175 mm
Thickness: 51 mm
Weight
1474 gr
ISBN-13
978-0-306-45045-7 (9780306450457)
DOI
10.1007/978-1-4615-1797-9
Schweitzer Classification
Content
I. Dynamic Characterization of Materials by Powder Diffraction.- II. Phase Analysis, Accuracy and Standards in Powder Diffraction.- III. Applications of Diffraction to Semiconductors and Films.- IV New Developments in X-Ray Sources, Instrumentation and Techniques.- V. Residual Stress, Crystallite Size and Rms Strain Determination by Diffraction Methods.- VI. Polymer Applications of X-Ray Scattering.- VII. Microbeam Xrd and Xrs Analysis.- VIII. In Vivo Applications of Xrs.- IX. Xrs Mathematical Methods, Trace Analysis and Other Applications.- X. Structural and Other Applications of Powder Diffraction.- Author Index.