
In-Situ Patterning:: Volume 158
Selective Area Deposition and Etching
Cambridge University Press
Published on 5. June 2014
Book
Paperback/Softback
520 pages
978-1-107-41035-0 (ISBN)
Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
More details
Series
Language
English
Place of publication
Cambridge
United Kingdom
Target group
College/higher education
Professional and scholarly
Product notice
Paperback (trade)
Dimensions
Height: 229 mm
Width: 152 mm
Thickness: 27 mm
Weight
690 gr
ISBN-13
978-1-107-41035-0 (9781107410350)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Classification
Persons
Editor
Lawrence Livermore National Laboratory, California
Massachusetts Institute of Technology
IBM T J Watson Research Center, New York