
Defect and Impurity Engineered Semiconductors and Devices III: Volume 719
Volume 719
Cambridge University Press
Published on 5. June 2014
Book
Paperback/Softback
512 pages
978-1-107-41192-0 (ISBN)
Description
This book focuses on the deliberate introduction and manipulation of defects and impurities in order to engineer desired properties in semiconductor materials and devices. In view of current exciting developments in wide-bandgap semiconductors like GaN for blue light emission, as well as high-speed and high-temperature electronics, dopant and defect issues relevant to these materials are addressed. Also featured are semiconductor nanocavities and nano-structures, with emphasis on the formation and impact of vacancy-type defects. Defect reaction problems pertaining to impurity gettering, precipitation and hydrogen passivation are specific examples of defect engineering that improve the electronic quality of the material. A number of papers also deal with characterization techniques needed to study and to identify defects in materials and device structures. Finally, papers also address issues such as interface control and passivation, application of ion implantation, plasma treatment and rapid thermal processing for creating/activating/suppressing trap levels, and device applications.
More details
Series
Language
English
Place of publication
Cambridge
United Kingdom
Target group
College/higher education
Professional and scholarly
Product notice
Paperback (trade)
Dimensions
Height: 229 mm
Width: 152 mm
Thickness: 26 mm
Weight
680 gr
ISBN-13
978-1-107-41192-0 (9781107411920)
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Schweitzer Classification
Other editions
Additional editions

S. Ashok | J. Chevallier | N. M. Johnsonn
Defect and Impurity Engineered Semiconductors and Devices III: Volume 719
Book
08/2002
Materials Research Society
€57.13
Article exhausted; check different version
Persons
Editor
Pennsylvania State University
National Renewable Energy Laboratory, Golden, Colorado