Advances in Imaging and Electron Physics: Volume 102
Academic Press
Published on 8. October 1997
Book
Hardback
330 pages
978-0-12-014744-1 (ISBN)
Description
Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical & Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Reviews / Votes
"Editing by P.W. Hawkes is immaculate and the production, in the usual style of Advances in Electronics and Electron Physics, results in a volume that will be a handsome addition to any bookshelf."--MRS BULLETIN"With the accelerating pace of research and development in so many areas of microscopy, keeping abreast of the widespread literature is becoming increasingly time-consuming. In Advances in Optical and Electron Microscopy the Editors are to be congratulated on bringing together in a convenient and comprehensible form a variety of topics of current interest."--J.A. Chapman in LABORATORY PRACTICEMore details
Series
Language
English
Place of publication
San Diego
United States
Publishing group
Elsevier Science Publishing Co Inc
Target group
Professional and scholarly
Researchers in electrical engineering, optical science and technology, materials science, image processing, and mechanical engineering.
Dimensions
Height: 229 mm
Width: 152 mm
Weight
650 gr
ISBN-13
978-0-12-014744-1 (9780120147441)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Classification
Other editions
Additional editions
Persons
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 - 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
Content
Contributors. Preface. R. Albanese and G. Rubinacci, Finite Element Methods for the Solution of 3D Eddy Current Problems: Introduction. Field Equations and Material Properties. Fields, Potentials, and Gauges. Edge Elements for 3D Field Problems. Integral Formulations for Linear and Nonlinear Eddy Currents. Differential Formulations and Constitutive Error Approach. Discussion and Conclusions. Acknowledgments. References. W. Chen and H. Ahmed, Nanofabricationfor Electronics: Introduction. Nanofabrication Methods. Pattern Transfer. Resolution Limit of Organic Resists. Applications of Nanostructures. References. A.D. Feinerman and D.A. Crewe, Miniature Electron Optics: Introduction. Scaling Lawsfor Electrostatic Lenses. Review. Fabrication of Miniature Magnetostatic Lenses. Electron Source. Detector. Electron Optical Calculations. Performance of a Stacked Einzel Lens. Summary and Future Prospects. References. S.A. Nepijko and N.N. Sedov,Aspects of Mirror Electron Microscopy: Introduction. Resolution of Mirror Electron Microscope. Distortion of Details of Object Image Under Observation in Mirror Electron Microscope. Limiting Sensitivity of Mirror Electron Microscope under Observation of Steps on Object. Image of Islands on Object Surfaces in Mirror Electron Microscope. Calculation of Image Contrast in Mirror Electron Microscope in the Focused Operation Mode. Conclusions. Acknowledgment. References. Subject Index.